Display device

ABSTRACT

A display device includes a substrate including an outer area neighboring a border; and an insulating layer positioned over the substrate and including a plurality of openings positioned over the outer area. The openings are arranged to be spaced from each other in a direction. The display device further includes a wavy line extending in the direction and passing the plurality of openings.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application is a continuation of U.S. patent application Ser. No.16/273,001, filed Feb. 11, 2019, which is a continuation of U.S. patentapplication Ser. No. 15/911,058, filed Mar. 2, 2018, now U.S. Pat. No.10,204,971, which is a continuation of U.S. patent application Ser. No.15/274,742, filed Sep. 23, 2016, now U.S. Pat. No. 9,911,798, whichclaims priority to and the benefit of Korean Patent Application No.10-2015-0144788, filed Oct. 16, 2015, the entire contents of all ofwhich are incorporated herein by reference.

BACKGROUND 1. Field

The described technology relates generally to a display device.

2. Discussion of the Related Technology

A display device is a device that displays an image, and recentlyorganic light emitting diode displays have been attracting attention.

Organic light emitting diode displays have a self-emissioncharacteristic and do not require a separate light source, unlike liquidcrystal displays, and thus their thickness and weight may be reduced.Further, organic light emitting diode displays have high qualitycharacteristics, such as low power consumption, high luminance, and highresponse speed.

In general, an organic light emitting diode display includes asubstrate, a plurality of thin film transistors positioned on thesubstrate, a plurality of insulating layers disposed between wiringsconfiguring the thin film transistors, and an organic light emittingelement connected to the thin film transistor.

Recently, flexible organic light emitting diode displays, which includea flexible substrate made of a polymer material as the substrate, havebeen developed.

The above information disclosed in this Background section is only toenhance the understanding of the background of the described technologyand therefore it may contain information that does not form the priorart that is already known in this country to a person of ordinary skillin the art.

SUMMARY

An embodiment provides a display device having improved durability.

One aspect of the invention provides a display device, which maycomprise: a substrate comprising an outer area neighboring a border; aninsulating layer positioned over the substrate and comprising aplurality of openings positioned over the outer area, the plurality ofopenings being disposed to be spaced from each other in a direction; anda wavy line extending in the direction and passing the plurality ofopenings.

In the foregoing device, the wavy line may be curved and extend alongthe top surfaces of the insulating layer and the bottom surfaces of theplurality of openings. The wavy line may contact the insulating layer.The display device may further comprise a cover layer covering theplurality of openings and the wavy line. The cover layer may have anisland shape. The cover layer may comprise an organic material. Theinsulating layer may comprise an inorganic material. The insulatinglayer may comprise an organic material.

Still in the foregoing device, the device may further comprise a displayunit neighboring the outer area and positioned over the substrate andcomprising an array of pixels. Each pixel of the display unit maycomprise an organic light emitting element positioned on the substrate;and a thin film transistor connected to the organic light emittingelement. The organic light emitting element may comprise: a firstelectrode connected to the thin film transistor; an organic emissionlayer positioned over the first electrode; and a second electrodepositioned over the organic emission layer. The thin film transistor maycomprise: an active layer positioned over the substrate; a gateelectrode positioned over the active layer; and a source electrode and adrain electrode connected to the active layer. The wavy line may bepositioned on a layer the same as that of at least one of the gateelectrode and the source electrode. The insulating layer may furthercomprise a first sub-insulating layer covering the gate electrode. Theplurality of openings may be formed in the first sub-insulating layer.The insulating layer may further comprise a second sub-insulating layercovering the active layer. The plurality of openings may be formed on atleast one layer of the first sub-insulating layer and the secondsub-insulating layer. The insulating layer may further comprise a thirdsub-insulating layer positioned between the substrate and the activelayer. The plurality of openings may be formed on at least one layeramong the first sub-insulating layer, the second sub-insulating layer,and the third sub-insulating layer.

Another aspect of the present invention provides a display deviceincluding a substrate including an outer area neighboring a border; aninsulating layer positioned on the substrate and including a pluralityof opening patterns corresponding to the outer area and disposed to beseparated from each other in one direction; and a wavy line extending inone direction and passing the plurality of opening patterns.

The wavy line may be curved and extend along the surface of theinsulating layer and each lower part of the plurality of openingpatterns.

The wavy line may contact the insulating layer.

A cover pattern covering the opening patterns and the wavy line may befurther included.

The cover pattern may have an island shape.

The cover pattern may include an organic material.

The insulating layer may include an inorganic material.

A display unit neighboring the outer area and positioned on thesubstrate may be further included.

The display unit may include an organic light emitting elementpositioned on the substrate and a thin film transistor connected to theorganic light emitting element.

The organic light emitting element may include a first electrodeconnected to the first thin film transistor, an organic emission layerpositioned on the first electrode, and a second electrode positioned onthe organic emission layer.

The thin film transistor may include an active layer positioned on thesubstrate, a gate electrode positioned on the active layer, and a sourceelectrode and a drain electrode connected to the active layer.

The wavy line may be positioned on the same layer as at least one of thegate electrode and the source electrode.

The insulating layer may further include a first sub-insulating layercovering the gate electrode.

The opening pattern may be formed in the first sub-insulating layer.

The insulating layer may further include a second sub-insulating layercovering the active layer.

The opening pattern may be formed in at least one layer of the firstsub-insulating layer and the second sub-insulating layer.

The insulating layer may further include a third sub-insulating layerpositioned between the substrate and the active layer.

The opening pattern may be formed in at least one layer among the firstsub-insulating layer, the second sub-insulating layer, and the thirdsub-insulating layer.

The insulating layer may include an inorganic material.

The insulating layer may include an organic material.

According to one of the described embodiments, a display device withimproved durability is provided.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a cross-sectional view showing a part of a display deviceaccording to an embodiment.

FIG. 2 is a cross-sectional view showing a part of a display deviceaccording to another embodiment.

FIG. 3 is a cross-sectional view showing a part of a display deviceaccording to another embodiment.

FIG. 4 is a cross-sectional view showing a part of a display deviceaccording to another embodiment.

FIG. 5 is a cross-sectional view showing a part of a display deviceaccording to another embodiment.

DETAILED DESCRIPTION

Hereinafter, embodiments of the present invention will be described morefully with reference to the accompanying drawings, in which embodimentsof the invention are shown. As those skilled in the art would realize,the described embodiments may be modified in various different ways, allwithout departing from the spirit or scope of the present invention.

In addition, the size and thickness of each configuration shown in thedrawings are arbitrarily shown for understanding and ease ofdescription, but the present invention is not limited thereto.

In the drawings, the thickness of layers, films, panels, regions, etc.,are exaggerated for clarity. In the drawings, the thicknesses of somelayers and areas are exaggerated for understanding and ease ofdescription. It will be understood that when an element such as a layer,film, region, or substrate is referred to as being “on” another element,it can be directly on the other element or intervening elements may alsobe present.

In addition, unless explicitly described to the contrary, the word“comprise” and variations such as “comprises” or “comprising”, will beunderstood to imply the inclusion of stated elements but not theexclusion of any other elements. Further, in the specification, the word“on” means positioning on or below the object portion, but does notessentially mean positioning on the upper side of the object portionbased on a direction of gravity.

Now, a display device according to an embodiment will be described withreference to FIG. 1.

Hereinafter, an organic light emitting diode display including anorganic light emitting element will be described as one example of thedisplay device; however, other embodiments may be various displaydevices that include a display unit displaying an image, such as aliquid crystal display (LCD).

FIG. 1 is a cross-sectional view showing a part of a display deviceaccording to an embodiment. FIG. 1 is a cross-sectional view showing acenter part and an outer part of the display device according to anembodiment.

As shown in FIG. 1, the display device according to an embodimentincludes a substrate 100, a display unit 200, a first insulating layerCIL, wavy line CL, a second insulating layer OIL, a cover layer CP, andan encapsulation part 300. The display device include an array ofpixels, each of which includes an organic light emitting element.

The substrate 100 may be flexible, but it is not limited thereto, andtherefore it may be stretchable, foldable, bendable, or rollable. Thesubstrate 100 is flexible, stretchable, foldable, bendable, or rollable,such that the entire display device may be flexible, stretchable,foldable, bendable, or rollable.

The substrate 100 may include at least one among the polymer materials,such as a polyimide, a metal material, and an inorganic material,however it is not limited thereto and any material that can be bent maybe included. The substrate 100 may have a film shape.

The substrate 100 includes a display area DA and an outer area or aboundary area OA adjacent to a border or an edge ED. The outer area OAof the substrate 100 is an outer part of the substrate 100. The displayarea DA of the substrate 100 is an area adjacent to the outer area OAand displays the image, and this display area DA is the center part ofthe substrate 100. In embodiments, when viewed in a viewing directionperpendicular to a major surface, the boundary area OA surrounds thedisplay area DA on which the pixels are disposed.

On the other hand, in an embodiment, the outer area OA is locatedoutside the substrate 100, however it is not limited thereto, and theouter area OA may be located on the center of the substrate 100 or mayoverlap the display area DA in another embodiment.

The display unit 200 is positioned on the substrate 100 whilecorresponding to the display area of the substrate 100 and may displayan image by using a plurality of pixels. Here, a pixel may mean aminimum unit for displaying an image.

The display unit 200 includes an organic light emitting element OLEDemitting light and a thin film transistor TFT connected to the organiclight emitting element OLED.

On the other hand, in an embodiment, for convenience of description, thedisplay unit 200 includes the organic light emitting element OLED andthe thin film transistor TFT, however it is not limited thereto, and thedisplay unit 200 may further include at least one scan wiring, at leastone data wire, a plurality of thin film transistors, and at least onecapacitor, and these disclosed elements may have various structures

The thin film transistor TFT includes an active layer AL, a gateelectrode GE, a source electrode SE, and a drain electrode DE.

The active layer AL is located on the substrate 100 and may be made of apolysilicon or an oxide semiconductor. The oxide semiconductor may bebased on one of titanium (Ti), hafnium (Hf), zirconium (Zr), aluminum(Al), tantalum (Ta), germanium (Ge), zinc (Zn), gallium (Ga), tin (Sn),or indium (In), zinc oxide (ZnO), indium-gallium-zinc oxide (InGaZnO4),indium zinc oxide (Zn—In—O), zinc-tin oxide (Zn—Sn—O), indium galliumoxide (In—Ga—O), indium-tin oxide (In—Sn—O), indium-zirconium oxide(In—Zr—O), indium-zirconium-zinc oxide (In—Zr—Zn—O),indium-zirconium-tin oxide (In—Zr—Sn—O), indium-zirconium-gallium oxide(In—Zr—Ga—O), indium-aluminum oxide (In—Al—O), indium-zinc-aluminumoxide (In—Zn—Al—O), indium-tin-aluminum oxide (In—Sn—Al—O),indium-aluminum-gallium oxide (In—Al—Ga—O), indium-tantalum oxide(In—Ta—O), indium-tantalum-zinc oxide (In-Ta—Zn-O), indium-tantalum-tinoxide (In—Ta—Sn—O), indium-tantalum-gallium oxide (In—Ta—Ga—O),indium-germanium oxide (In—Ge—O), indium-germanium-zinc oxide(In—Ge—Zn—O), indium-germanium-tin oxide (In—Ge—Sn—O), indium-germaniumgallium oxide (In—Ge—Ga—O), titanium-indium-zinc oxide (Ti—In—Zn—O), andhafnium-indium-zinc oxide (Hf—In—Zn—O), which are complex oxidesthereof.

The active layer AL includes a channel area in which impurities are notdoped, and a source area and a drain area in which impurities are dopedat respective sides of the channel area. Herein, the impurities varyaccording to a kind of thin film transistor, and may be N-typeimpurities or P-type impurities. When the active layer AL is formed ofthe oxide semiconductor, a separate passivation layer may be added inorder to protect the oxide semiconductor, which is vulnerable to theexternal environment such as exposure to a high temperature.

The gate electrode GE is positioned on the active layer AL, and thesource electrode SE and the drain electrode DE are positioned on thegate electrode GE and are respectively connected to the source regionand the drain region of the active layer AL through contact holes.

To prevent shorting of the active layer AL, the gate electrode GE, thesource electrode SE, and the drain electrode DE, as the elements of thethin film transistor TFT, the first insulating layer CIL is positionedbetween the elements of the thin film transistor TFT.

The organic light emitting element OLED includes a first electrode E1connected to a drain electrode DE of the thin film transistor TFTthrough a contact hole formed in the second insulating layer OIL, anorganic emission layer OL positioned on the first electrode E1, and asecond electrode E2 positioned on the organic emission layer OL.

The first electrode E1 may be an anode, which is a hole injectionelectrode, and may be any one of a light reflective electrode, a lighttransflective electrode, and a light transmitting electrode. Meanwhile,in another embodiment, the first electrode E1 may be a cathode, which isan electron injection electrode.

The organic emission layer OL is positioned on the first electrode E1.The organic emission layer OL may be formed of a low molecular organicmaterial or a high molecular organic material such as poly3,4-ethylenedioxythiophene (PEDOT), or the like. The organic emissionlayer OL may include a red organic emission layer emitting red light, agreen organic emission layer emitting green light, and a blue organicemission layer emitting blue light, wherein the red organic emissionlayer, the green organic emission layer, and the blue organic emissionlayer are respectively formed in a red pixel, a green pixel, and a bluepixel to implement a color image.

The red organic emission layer, the green organic emission layer, andthe blue organic emission layer are stacked as the organic emissionlayer OL in all of the red pixel, the green pixel, and the blue pixeland a red color filter, a green color filter, and a blue color filterare formed in each pixel, thereby making it possible to implement thecolor image.

As another example, a white organic emission layer emitting white lightis formed as the organic emission layer OL in all of the red pixel, thegreen pixel, and the blue pixel and a red color filter, a green colorfilter, and a blue color filter are formed in each pixel, thereby makingit possible to implement the color image. In the case of implementingthe color image using the white organic emission layer, which is theorganic emission layer OL, and the color filter, deposition masks fordepositing the red organic emission layer, the green organic emissionlayer, and the blue organic emission layer on the respective individualpixels, in embodiments, the red pixel, the green pixel, and the bluepixel do not need to be used. The white organic emission layer, which isthe organic emission layer OL described in another example, may beformed of one organic emission layer or may include a configuration inwhich a plurality of organic emission layers are stacked to emit whitelight.

As an example, the organic emission layer OL may include a configurationin which at least one yellow organic emission layer and at least oneblue organic emission layer are combined with each other to allow whitelight to be emitted, a configuration in which at least one cyan organicemission layer and at least one red organic emission layer are combinedwith each other to allow white light to be emitted, a configuration inwhich at least one magenta organic emission layer and at least one greenorganic emission layer are combined with each other to allow white lightto be emitted, and the like.

The second electrode E2 may be positioned on the organic emission layerEL and may be a cathode, which is an electron injection electrode. Thesecond electrode E2 may be any one of a light reflective electrode, alight transflective electrode, and a light transmitting electrode. Thesecond electrode E2 is positioned over the entirety of the display areaDA of the substrate SUB so as to cover the organic emission layer EL.Meanwhile, in another embodiment, the second electrode E2 may be ananode, which is a hole injection electrode.

The first insulating layer CIL includes a first sub-insulating layer ILLa second sub-insulating layer IL2, and a third sub-insulating layer IL3.

The first sub-insulating layer IL1 covers the gate electrode GE andfunctions to prevent shorting between the gate electrode GE and thesource electrode SE. The first sub-insulating layer IL1 may be formed ofat least one layer.

The second sub-insulating layer IL2 covers the active layer AL and ispositioned between the active layer AL and the gate electrode GE. Thesecond sub-insulating layer IL2 may function to prevent the shortingbetween the active layer AL and the gate electrode GE. The secondsub-insulating layer IL2 may be formed of at least one layer.

The third sub-insulating layer IL3 is positioned between the substrate100 and the active layer AL and may function to flatten the surface ofthe substrate 100 and simultaneously prevent moisture from permeatingthe substrate 100.

As such, the first insulating layer CIL includes an inorganic materialsuch as silicon nitride or silicon oxide; for example, the firstinsulating layer CIL may include at least one among SiNx, Al₂O₃, SiO₂,and TiO₂.

The first insulating layer CIL includes a plurality of openings OPdisposed to be separated from each other in one direction correspondingto the outer area OA of the substrate 100. Here, one direction may be adirection from the display area DA of the substrate 100 to the outerarea OA, or a direction from the outer area OA of the substrate 100 tothe border ED of the substrate 100, however it is not limited theretoand the direction may differ from the above-described direction.

The opening OP is formed in the first insulating layer CIL, morespecifically, the opening OP is formed in the first sub-insulating layerILL the second sub-insulating layer IL2, and the third sub-insulatinglayer IL3 included in the first insulating layer CIL.

On the other hand, in an embodiment, the opening OP is formed in thefirst sub-insulating layer IL1, the second sub-insulating layer IL2, andthe third sub-insulating layer IL3, however it is not limited theretoand the opening OP may be formed in at least one of the firstsub-insulating layer IL1, the second sub-insulating layer IL2, and thethird sub-insulating layer IL3.

The distance between the adjacent openings OP among the plurality ofopenings OP may have a predetermined distance, however it is not limitedthereto and the distance between the adjacent openings OP may changedepending on a design. The plurality of openings OP may have a linear, anonlinear, or an island form when viewed in the viewing direction.

The wavy line or undulating line CL may include the same material as atleast one among the gate electrode GE, the source electrode SE, thedrain electrode DE of the thin film transistor TFT included in thedisplay unit 200. For example, the wavy line CL is positioned on thesame layer as the source electrode SE and the drain electrode DE,includes the same material as the source electrode SE and the drainelectrode DE, and may be simultaneously formed with the source electrodeSE and the drain electrode DE.

Meanwhile, in an embodiment, the wavy line CL is positioned on the samelayer as the source electrode SE and the drain electrode DE, however itis not limited thereto and the wavy line CL may be positioned on thesame layer as at least one among the active layer AL, the gate electrodeGE, the source electrode SE, and the drain electrode DE. The wavy lineCL may include a metal material.

The wavy line CL corresponds to the outer area OA of the substrate 100and is positioned on the first insulating layer CIL and extends in thedirection in which the plurality of openings OP are separated to havethe plurality of openings OP. The wavy line CL is curved and extendsalong the surface of the first insulating layer CIL and each lower partof the plurality of openings OP. The wavy line CL contacts the firstinsulating layer CIL, is curved, and extends, more specifically, thewavy line CL is curved several times in the direction vertical to thesurface of the substrate 100 and extends in the direction parallel tothe surface of the substrate 100 along the pattern of the firstinsulating layer CIL having the island shape formed by the plurality ofopenings OP and separated from each other, thereby vertically having aserpentine form. In an embodiment, the wavy line CL has the verticallyserpentine form, however it is not limited thereto and the wavy line CLmay have a horizontally serpentine form in another embodiment. In thiscase, the wavy line CL may be curved several times in the directionparallel to the surface of the substrate 100 and may extend in thedirection parallel to the surface of the substrate 100.

As described above, in the display device according to an embodiment, asthe first insulating layer CIL includes the plurality of openings OPdisposed to be separated from each other in a direction by correspondingto the outer area OA of the substrate 100, the part of the firstinsulating layer CIL positioned corresponding to the outer area OA hasthe island shape on the substrate 100. By having the first insulatinglayer CIL positioned at the outer area OA neighboring the border ED ofthe substrate 100 on the substrate 100, even if an external impact isapplied to the border ED of the substrate 100 such that the stress isapplied to the first insulating layer CIL, since the stress is blockedby the opening OP, the stress is inhibited from being transmitted to thedisplay unit 200 through the first insulating layer CIL.

In embodiments, although the first insulating layer CIL has a uniquebrittleness for the inorganic material, since the first insulating layerCIL includes the plurality of openings OP disposed to be separated orspaced from each other in a direction by corresponding to the outer areaOA of the substrate 100, even if stress is applied to the border ED ofthe substrate 100, the stress is blocked by the opening OP, and thestress is minimized from being transmitted to the display unit 200.

Also, in the display device according to an embodiment, since the wavyline CL has a vertically winding shape corresponding to the outer areaOA, even if an impact is applied to the border ED of the substrate 100such that the stress is applied to the wavy line CL, since the stress isdispersed along the long path of the wavy line CL within the outer areaOA, the wavy line CL and the first insulating layer CIL covering thewavy line CL are prevented from being destroyed by the stress.

The second insulating layer OIL is positioned between the firstelectrode E1 of the organic light emitting element OLED and the drainelectrode DE of the thin film transistor TFT. The second insulatinglayer OIL includes a contact hole, and the first electrode E1 and thedrain electrode DE are connected through the contact hole. The secondinsulating layer OIL includes an organic material, including at leastone among polyimide, phenylene, and siloxane.

The cover layer CP is positioned on the wavy line CL corresponding tothe outer area OA of the substrate 100. The cover layer CP covers theopenings OP and the wavy line CL. The cover layer CP has an island shapeand the surface of the cover layer CP has a curved shape. The coverlayer CP is positioned on the same layer as the second insulating layerOIL, thereby including the same material as the second insulating layerOIL and being simultaneously formed with the second insulating layerOIL. Accordingly, the second insulating layer OIL may include theorganic material.

Meanwhile, in an embodiment, the cover layer CP is positioned on thesame layer as the second insulating layer OIL, however it is not limitedthereto and the cover layer CP may be positioned from the secondinsulating layer OIL, thereby including material different from thesecond insulating layer OIL.

As described above, in the display device according to an embodiment,since the cover layer CP including the organic material covers theopenings OP and the wavy line CL, even if an impact is applied to theborder ED of the substrate 100 such that stress is applied to theopenings OP and the wavy line CL, since the cover layer CP is deformedby the stress such that the stress is dispersed within the cover layerCP, the wavy line CL, the first insulating layer CIL covering the wavyline CL, and the cover layer CP are prevented from being destroyed bythe stress.

Also, in the display device according to an embodiment, although thefirst insulating layer CIL includes an inorganic material, such that thefirst insulating layer CIL is brittle, since the wavy line CL coveringthe openings OP of the first insulating layer CIL includes a metalmaterial, and simultaneously the cover layer CP covering the wavy lineCL includes the organic material, the first insulating layer CIL, thewavy line CL, and the cover layer CP are prevented from being destroyedby the stress. In embodiments, the display device with improveddurability is provided.

The encapsulation part 300 is positioned on the substrate 100. Theencapsulation part 300 is positioned on the substrate 100 throughout thedisplay area DA and the outer area OA of the substrate 100 andencapsulates the display unit 200 along with the substrate 100. Theencapsulation part 300 may be formed of a thin film encapsulation. Theencapsulation part 300 may include an organic layer and an inorganiclayer positioned on the organic layer. As one example, the encapsulationpart 500 may include one or more organic layers and one or moreinorganic layers, which are alternately laminated, and morespecifically, there may be a plurality of the inorganic layers or theorganic layers, and the plurality of inorganic layers and the pluralityof organic layers may be alternately laminated.

The encapsulation part 300 may include at least one sandwich structurein which at least one organic layer is inserted between at least twoinorganic layers. The inorganic layer positioned on the top layer of theencapsulation part 300 may be laminated with a larger area than theorganic layer so as to cover an end of the organic layer, which isanother layer. The organic layer of the encapsulation part 300 is madeof polymer, and preferably, may be a single layer or a laminated layerformed of any one of polyethylene terephthalate, polyimide,polycarbonate, epoxy, polyethylene, and polyacrylate. For example, theorganic layer may be formed of polyacrylate, and more specifically,includes a material in which a monomer composition includingdiacrylate-based monomers and triacrylate-based monomers is polymerized.Herein, the monomer composition may further include monoacrylate-basedmonomers, and further include a known photo-initiator such as TOP, butis not limited thereto. The inorganic layer of the encapsulation part500 may be a single layer or a laminated layer including metal oxide ormetal nitride. More specifically, the inorganic layer may include one ormore of SiNx, Al₂O₃, SiO₂, and TiO₂.

A protection film may be positioned at each of an upper portion of theencapsulation part 300 and a lower portion of the flexible substrate100, and at least one optical film of a phase difference film and apolarization film may be positioned on or under the protection film.

As described above, in the display device according to an embodiment,since the first insulating layer CIL includes the plurality of openingsOP disposed to be separated or spaced from each other in a directioncorresponding to the outer area OA of the substrate 100, the part of thefirst insulating layer CIL positioned corresponding to the outer area OAhas the island shape on the substrate 100. Since the first insulatinglayer CIL positioned at the outer area OA neighboring the border ED ofthe substrate 100 on the substrate 100, even if an external impact isapplied to the border ED of the substrate 100 such that stress isapplied to the first insulating layer CIL, since the stress is blockedby the opening OP, the stress is inhibited from be transmitted to thedisplay unit 200 through the first insulating layer CIL.

In embodiments, although the first insulating layer CIL has a uniquebrittleness for the inorganic material, since the first insulating layerCIL includes the plurality of openings OP disposed to be separated fromeach other in the direction corresponding to the outer area OA of thesubstrate 100, even if stress is applied to the border ED of thesubstrate 100, the stress is blocked by the opening OP, and thus thestress is minimized from being transmitted to the display unit 200.

Also, in the display device according to an embodiment, since the wavyline CL has the vertically winding shape corresponding to the outer areaOA, even if the impact is applied to the border ED of the substrate 100such that stress is applied to the wavy line CL, since the stress isdispersed along the long path of the itself wavy line CL within theouter area OA, the wavy line CL and the first insulating layer CILcovering the wavy line CL are prevented from being destroyed by thestress.

Also, in the display device according to an embodiment, since the coverlayer CP including the organic material covers the openings OP and thewavy line CL, even if the impact is applied to the border ED of thesubstrate 100 such that the stress is applied to the openings OP and thewavy line CL, since the cover layer CP is deformed by the stress suchthat the stress is dispersed within the cover layer CP, the wavy lineCL, the first insulating layer CIL covering the wavy line CL, and thecover layer CP are prevented from being destroyed by the stress.

Also, in the display device according to an embodiment, although thefirst insulating layer CIL includes an inorganic material such that thefirst insulating layer CIL is brittle, since the wavy line CL coveringthe openings OP of the first insulating layer CIL includes a metalmaterial, and simultaneously the cover layer CP covering the wavy lineCL includes an organic material, the first insulating layer CIL, thewavy line CL, and the cover layer CP are prevented from being destroyedby the stress.

In embodiments, by including the first insulating layer CIL with theopening OP, the wavy line CL, and the cover layer CP, the display devicewith improved durability is provided.

Next, the display device according to another embodiment will bedescribed with reference to FIG. 2. Hereinafter, parts of the displaydevice according to an embodiment, different from those described above,will be described.

FIG. 2 is a cross-sectional view of a part of a display device accordingto another embodiment.

As shown in FIG. 2, the display device according to another embodimentincludes the substrate 100, the display unit 200, the first insulatinglayer CIL, the wavy line CL, the second insulating layer OIL, and theencapsulation part 300.

At least one layer among the first sub-insulating layer IL1, the secondsub-insulating layer IL2, and the third sub-insulating layer IL3 of thefirst insulating layer CIL includes an organic material, including atleast one among polyimide, phenylene, and siloxane. In embodiments, thefirst insulating layer CIL includes an organic material including atleast one among polyimide, phenylene, and siloxane.

The plurality of openings OP is formed in the first insulating layerCIL, and more specifically, is formed in the first sub-insulating layerIL1, the second sub-insulating layer IL2, and the third sub-insulatinglayer IL3.

As described, since the first insulating layer CIL according to anotherembodiment includes a large Young's modulus, even if an impact isapplied to the border ED of the substrate 100 such that stress isapplied to the openings OP and the wavy line CL, since the firstinsulating layer CIL is deformed by the stress such that the stress isdispersed within the first insulating layer CIL, the wavy line CL andthe first insulating layer CIL covered by the wavy line CL is preventedfrom being destroyed by the stress.

According to another embodiment, by including the first insulating layerCIL formed with the opening OP and including an organic material and thewavy line CL, the display device with improved the durability isprovided.

Next, the display device according to another embodiment will bedescribed with reference to FIG. 3. Hereinafter, parts of the displaydevice according to an embodiment, different from those described above,will be described.

FIG. 3 is a cross-sectional view of a part of a display device accordingto another embodiment.

As shown in FIG. 3, the display device according to another embodimentincludes the substrate 100, the display unit 200, the first insulatinglayer CIL, the wavy line CL, the second insulating layer OIL, the coverlayer CP, and the encapsulation part 300.

The plurality of openings OP is formed in the first insulating layerCIL, and more specifically, is formed in the first sub-insulating layerIL1 and the second sub-insulating layer IL2.

The wavy line CL is positioned on the same layer as the source electrodeSE and the drain electrode DE, and thus includes the same material asthe source electrode SE and the drain electrode DE and is simultaneouslyformed with the source electrode SE and the drain electrode DE.

As described above, in the display device according to anotherembodiment, since the first insulating layer CIL includes the pluralityof openings OP disposed to be separated from each other in the directioncorresponding to the outer area OA of the substrate 100, the part of thefirst insulating layer CIL positioned corresponding to the outer area OAhas the island shape on the substrate 100. Since the first insulatinglayer CIL is positioned at the outer area OA neighboring the border EDof the substrate 100 on the substrate 100, even if an external impact isapplied to the border ED of the substrate 100 such that stress isapplied to the first insulating layer CIL, since the stress is blockedby the opening OP, the stress is inhibited from be transmitted to thedisplay unit 200 through the first insulating layer CIL.

As described, although the first insulating layer CIL has a uniquebrittleness for the inorganic material, since the first insulating layerCIL includes the plurality of openings OP disposed to be separated fromeach other in the direction corresponding to the outer area OA of thesubstrate 100, even if the stress is applied to the border ED of thesubstrate 100, the stress is blocked by the opening OP, and the stresstransmitted to the display unit 200 is reduced.

In embodiments, by including the first insulating layer CIL includingthe plurality of openings OP, the wavy line CL, and the cover layer CP,the display device with improved durability is provided.

Next, the display device according to another embodiment will bedescribed with reference to FIG. 4. Hereinafter, parts of the displaydevice according to an embodiment, different from those described above,will be described.

FIG. 4 is a cross-sectional view of a part of a display device accordingto another embodiment.

As shown in FIG. 4, the display device according to another embodimentincludes the substrate 100, the display unit 200, the first insulatinglayer CIL, the wavy line CL, the second insulating layer OIL, the coverlayer CP, and the encapsulation part 300.

The opening OP is formed in the first insulating layer CIL, and morespecifically, is formed in the first sub-insulating layer IL1.

The wavy line CL is positioned on the same layer as the source electrodeSE and the drain electrode DE, and thus includes the same material asthe source electrode SE and the drain electrode DE and is simultaneouslyformed with the source electrode SE and the drain electrode DE.

As described, although the first insulating layer CIL has a uniquebrittleness for the inorganic material, since the first insulating layerCIL includes the plurality of openings OP disposed to be separated fromeach other in the direction corresponding to the outer area OA of thesubstrate 100, even if stress is applied to the border ED of thesubstrate 100, the stress is blocked by the opening OP, and the stresstransmitted to the display unit 200 is minimized.

In embodiments, by including the first insulating layer CIL with theplurality of openings OP, the wavy line CL, and the cover layer CP, thedisplay device with improved durability is provided.

Next, the display device according to another embodiment will bedescribed with reference to FIG. 5. Hereinafter, parts of the displaydevice according to an embodiment, different from those described above,will be described.

FIG. 5 is a cross-sectional view of a part of a display device accordingto another embodiment.

As shown in FIG. 5, the display device according to another embodimentincludes the substrate 100, the display unit 200, the first insulatinglayer CIL, the wavy line CL, the second insulating layer OIL, the coverlayer CP, and the encapsulation part 300.

The opening OP is formed in the first insulating layer CIL, and morespecifically, is formed in the second sub-insulating layer IL2 and thethird sub-insulating layer IL3.

The wavy line CL is positioned on the same layer as the gate electrodeGE, and thus includes the same material as the gate electrode GE and issimultaneously formed with the gate electrode GE.

As described, although the first insulating layer CIL has a uniquebrittleness for the inorganic material, since the first insulating layerCIL includes the plurality of openings OP disposed to be separated fromeach other in the direction corresponding to the outer area OA of thesubstrate 100, even if stress is applied to the border ED of thesubstrate 100, the stress is blocked by the opening OP, and thus thestress transmitted to the display unit 200 is minimized.

In embodiments, by including the first insulating layer CIL with theplurality of openings OP, the wavy line CL, and the cover layer CP, thedisplay device with improved durability is provided.

Referring to FIGS. 1 to 5, in embodiments, a display device includes asubstrate 100 and is divided into a display section DA and a boundarysection OA which may completely or partially surround the displaysection when viewed in a viewing direction perpendicular to a majorsurface of the substrate. In the display section, the display deviceincludes an array of pixels, each of which includes an organic lightemitting diode OLED and at least a thin film transistor TFT electricallyconnected to the organic light emitting diode. The boundary section OAmay extend along the edge or side ED of the display.

The display device includes a base insulation layer IL1, a gateinsulation layer IL2 and an interlayer insulation layer IL3 which aresequentially stacked in the boundary section OA to form an integratedinsulation layer CIL. The layer CIL may be formed with an inorganicmaterial and may be brittle. Thus, cracks may be created in the layerCIL by impacts applied to the edge or side ED or by bending the displaydevice, and may be propagated or transmitted toward portions of thelayer CIL in the display section. To avoid or minimize such propagation,in embodiments, a plurality of openings OP are formed in the portions ofthe layer CIL located in the boundary section OA. The openings OP mayform a pattern. In embodiments, the openings OP may be arranged to bespaced from each other in a first direction (for example, a directiongenerally perpendicular to the side ED).

In embodiments, each opening OP may be a hole, a pit, a trench, agroove, a channel or a notch. In one embodiment, the openings OP mayextend generally in parallel to the side ED when viewed in the viewingdirection. In another embodiment, the openings OP may be a plurality ofholes arranged in the boundary section OA. In embodiments, the openingOP may be a through-hole formed through the layer CIL. The opening maybe a hole formed through one or two among the sub-layers Ill, IL2 andIL3. (See FIGS. 3-5.)

An undulating conductive material line CL is formed to cross theopenings OP when viewed in the viewing direction. The line CL may extendin the first direction while contacting the top surface of the layer CILand the side surfaces of the bottom surfaces of the openings OP suchthat the line CL is undulating. When making the display, in embodiments,an electrically conductive material or metal may be formed over thelayer CIL with the openings OP and patterned to form the undulating lineCL as well as the source and drain electrodes SE and DE. In oneembodiment, the undulating line CL may be used to transmit an electricsignal from a driver to the pixels. In another embodiment, theundulating line CL is not used as an electric line or wire. Theundulating structure of the line CL may minimize or avoid the risk ofbreakage which may be caused by the cracks in the layer CIL. Further, inembodiments, the undulating structure of the metal line CL may providedurability to the layer CIL.

In embodiments, the openings OP may be covered and filled with anothermaterial, for example, an organic material. In the illustratedembodiment, the cover layer CP covers the openings OP.

While this disclosure has been described in connection with what ispresently considered to be practical embodiments, it is to be understoodthat the invention is not limited to the disclosed embodiments, but, onthe contrary, is intended to cover various modifications and equivalentarrangements included within the spirit and scope of the appendedclaims.

What is claimed is:
 1. A display device comprising: a substratecomprising an outer area neighboring a border; an insulating layerpositioned over the substrate and comprising a plurality of openingspositioned over the outer area, the plurality of openings being arrangedto be spaced from each other in a direction; and a wavy line extendingin the direction and passing the plurality of openings.